Design Flaw is a multi-part photographic series that investigates the fault lines between individual identity and societal frameworks. Each image captures the precise moment when rigid grids of expectation fracture under the pressure of desire, belonging, and quiet rebellion. With a tone that shifts between sly provocation and playful defiance, the series invites viewers to recognize their own cracks in the system as sites of creative power.

“Fotografie 42,” unveiled at the Basler Kunsttage 2025 in collaboration with the Basler Kunstgesellschaft, serves as the public culmination of this exploration—its final frame both a summation and an invitation. Through these ruptures, Design Flaw reclaims vulnerability as strength, celebrating the individuality that emerges when we refuse to fit neatly into predefined molds.

This is part two of the project.